Chemical Vapor Deposition
Conformity over complex 3D surfaces
Chemical vapor deposition (CVD) is a thin film deposition technology that provides uniform, dense, high purity coatings with excellent step coverage and conformity over complex 3D surfaces. CVD reaction parameters allow for control of the coating composition, crystallinity, defect density, and internal stresses.
CVD Equipment Coating Systems
ALD Systems
APCVD Systems
Cluster Tools
CMC Systems
Crystal Growth Systems
CVI Systems
HVPE Systems
LPCVD Systems
LPE Systems
MOCVD Systems
PECVD Systems
RTP/RTA Systems
SAS Systems
SiQC Systems
UHVCVD Systems
Properties & Characteristics
Coatings Deposited by Chemical Vapor Deposition Enhance a Component’s Properties and Characteristics
- Corrosion protection and barrier layers
- Environmental coatings
- Antifouling
- Encapsulation
- Friction/tribology
- Wear resistance
- Aesthetics/cosmetics
- Hydrophobicity/hydrophilicity
- Thermal conductivity/insulation
- Electrical conductivity/insulation
- Catalytic activity
- Photon reflectivity/absorbance
- Shock absorption
- Compressibility
- Mechanical bonding/interlocking
- Surface or contact area
- Fire retardancy
- Biocompatibility
Coatings are often designed to perform multiple functions.
Types of Industrial Coatings
OPTICAL PROPERTIES
- photoluminescent coatings
- antireflective coatings
- photochromatic coatings
STRUCTURAL PROPERTIES
- hard coatings
- anti-abrasion coatings
- anti-corrosion coatings
ELECTRICAL PROPERTIES
- antistatic coatings
- conductive coatings
- dielectric coatings
BIOENGINEERED PROPERTIES
- anti-microbial coatings
- biocompatible coatings
- bone compatible coatings
THERMAL PROPERTIES
- heat resistant coatings
- thermal interface coatings
- intumescent coatings
PHYSICO-CHEMICAL PROPERTIES
- photocatalytic coatings
- hydrophilic coatings
- hydrophobic coatings