Plasma Enhanced CVD (PECVD) Systems
PECVD processing is used for substrates that have a lower thermal budget requirement. A plasma of the reacting gases is formed in an electric field (DC or RF) to allow reactions to occur and layers to deposit at a lower temperature.
Our PECVD systems are designed and manufactured for industrial applications. We also offer EasyTube® systems through our opens in a new windowFirstNano® brand of R&D products for CNT and graphene growth at lower temperature using remote RF plasma.
powered by CVDWinPrC™
Operated through our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check and create new recipes, and view realtime or saved process data.
The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.
The images shown are examples of many CVD systems we design and manufacture in-house for innovators working on next generation process and material development.
We have customers worldwide at universities, governmental labs, start-ups, and fortune 500 companies.