AP5150 Atmospheric Pressure Chemical Vapor Deposition System
For deposition of semiconducting, dielectric, and insulating thin films such as boron phosphor silicate glass (BPSG). Click below to learn about the features of the system.
Chemical vapor deposition (CVD) is a film deposition technology that provides uniform, dense, high purity coatings with excellent step coverage and conformity over complex 3D surfaces.
Conformity over complex 3D surfaces
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Broad Range of CVD Production, R&D Processing, and Gas Delivery Systems
Develops and manufactures process equipment solutions for pilot and volume production applications
R&D systems for processing graphene, carbon nanotubes, semiconducting nanowires, 2D materials, and thin films
Ultra high purity (UHP) gas and chemical delivery systems and installations for high-tech fabrication processes
CENTRAL ISLIP, N.Y., (Business Wire) – July 29, 2021 - CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – May 5, 2021 – CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems, announced today. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – May 4, 2021 - CVD Equipment Corporation (NASDAQ: CVV), announced today that its subsidiary, CVD MesoScribe Technologies. Continue reading