Atmospheric Pressure CVD (APCVD) Systems
APCVD is a thin film deposition process with typically high deposition rates. CVD Equipment Corporation offers solutions to scale up your APCVD processes from research to production volumes.
Our APCVD systems are used to deposit a layer of material typically several micrometers thick onto wafers or other types of substrates. They are used to grow epitaxial films of Si, compound semiconductors, SiO2, anti-reflection (AR) coatings, and transparent conductive oxide (TCO) coatings. APCVD is also used as a surface finishing process for items such as tools and turbine blades to improve lifetime and performance.
powered by CVDWinPrC™
Operated through our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check and create new recipes, and view realtime or saved process data.
The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.