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At a Glance
Central Islip, NY
NUMBER OF EMPLOYEES
CVD Equipment Corporation provides both equipment and material service products. We design, develop, and manufacture a broad range of state-of-the-art chemical vapor deposition equipment for use in research and production applications. In our wholly owned CVD Materials Corporation, we provide material process solutions to end customers, as well as use the solutions internally to provide competitive coating solutions. Our equipment is used to conduct materials research and production manufacturing for a multitude of end markets including but not limited to, defense, aerospace components, medical, semiconductors, solar cells, smart glass, lasers, LEDs, MEMS, nanomaterials and other applications. Through our application laboratory, we provide process development support and process startup assistance with the focus on enabling tomorrow’s technologies™. Our wholly owned subsidiary CVD Materials Corporation uses our equipment to provide advanced surface treatments and coatings that serve demanding applications in biomedical, petroleum, pharmaceutical, aerospace, defense and many other industrial markets.
Chemical Vapor Deposition technology is used in many billion-dollar growth markets to manufacture high performance materials. CVD applies its 38 years of business and IP expertise across numerous applications and industries to accelerate the commercialization of novel technologies and provide for increased production at lower cost.
CVD, through its FirstNano® R&D and CVD production products, focuses on accelerating the research to commercialization of tomorrow’s technologies. Working with innovators from universities, startups, and industrial companies, CVD helps them transition from R&D to production by providing a cost-efficient road map for their pilot, production, and system solution needs. CVD also operates an application laboratory where novel ideas and pilot system performance can be quickly and economically evaluated.
In early 2017, CVD Materials Corporation launched the acquired Tantaline® surface treatment and coating services. The Tantaline® process provides a rugged and corrosion resistant protection for critical applications.
In October 2017, CVD Materials Corporation acquired the assets including all intellectual property of MesoScribe Technologies Inc. a New York company. MesoScribe Technologies develops and provides products and services with its proprietary direct write deposition, MesoPlasma™ technology.
In November 2017, we expanded our investment in CVD Materials Corporation with a $13.9 million purchase of a 180,000 sq. ft. facility to house our materials manufacturing operations. During the third quarter 2019, the Company completed the relocation of its Mesoscribe™ facility from California into the new materials manufacturing facility. In addition, with other materials operations coming online, the Company has been increasing its marketing efforts by showcasing our new facility operations and offering material coating services to new and existing customers.
CVD’s customers include global leaders in aerospace, defense, medical, petroleum, semiconductor, mems, and advanced materials research. As a result of being focused on chemical vapor deposition processes, coating services, and selling our CVD research solutions worldwide, we have the unique and diversified capability to provide solutions to many of the industrial applications presented to us, thus fueling our growth into the future.
In September 2019, CVD MesoScribe Technologies Corporation, in partnership with Pennsylvania State University, has been awarded a development grant from the U.S. Department of Energy’s Advanced Research Projects Agency-Energy (ARPA-E). This award will be used to develop and demonstrate the integration of printed sensors into additively manufactured gas turbine components that operate in a high temperature combustion environment.
On the R&D front, the Company has been working on our fluid reactor technology and have received an Applied Research & Development (ARAD) award in collaboration with the Center of Biotechnology at Stony Brook University. This will help further our novel, patent pending technology on an improved Extracorporeal Membrane Oxygenation (ECMO) device. We anticipate further collaboration for this promising technology and application.
Latest Press Releases
CENTRAL ISLIP, N.Y., (Business Wire) – March 31, 2021 - CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems and materials, today announced its. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – March 26, 2021 – CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems, announced today that it will release its. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – March 9, 2021 – CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems and materials, today announced that its Board. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – February 23, 2021 – CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems and materials, has announced the appointment of. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) - January 28, 2021 - The following is a letter from CVD Equipment Corporation President and CEO Emmanuel Lakios:
Dear CVD Shareholders:
As we announced this past. Continue reading