|CVD Equipment Corporation: NASDAQ: CVV
355 South Technology Drive, Central Islip NY 11722
Phone: +1 631-981-7081 | Fax: +1 631-981-7095
Date Founded: 1982
Number of Employees: apx. 200
Last updated on: 09/30/2017
Market Capitalization: $70.5M
Share Price: $11.00 as of September 30, 2017
Shares Outstanding: 6,409,891
CVD Equipment Corporation designs, develops, and manufactures a broad range of chemical vapor deposition, gas control, and other state-of-the-art equipment and process solutions used to develop and manufacture materials and coatings for research and industrial applications. This equipment is used by our customers to research, design, and manufacture these materials or coatings for aerospace engine components, medical implants, semiconductors, solar cells, smart glass, carbon nanotubes, nanowires, LEDs, MEMS, and other applications. Through our application laboratory, we provide process development support and process startup assistance with the focus on enabling tomorrow’s technologies™. Its wholly owned subsidiary CVD Materials Corporation provides advanced metal surface treatments and coatings serving demanding applications in the biomedical, petroleum, pharmaceutical, and many other industrial markets.
Chemical Vapor Deposition technology is used in many billion-dollar growth markets to manufacture high performance materials. CVD applies its 35 years of business and IP expertise across numerous applications and industries to accelerate the commercialization of novel technologies and provide for increased production at lower cost.
CVD, through its FirstNano® R&D and CVD production products, focuses on accelerating the commercialization of tomorrow’s technologies. Working with innovators from universities, startups, and industrial companies, CVD helps them transition from R&D to production by providing a cost-efficient road map for their pilot, production, and system solution needs. CVD also operates an application laboratory where novel ideas and pilot system performance can be quickly and economically evaluated.
In early 2017, CVD Materials Corporation launched the acquired Tantaline® surface treatment and coating services. The Tantaline® process provides a rugged and corrosion resistant protection for critical applications.
In late 2017, CVD Materials Corporation acquired the assets including all intellectual property of MesoScribe Technologies Inc. a New York company. MesoScribe Technologies develops and provides products and services with its proprietary direct write deposition, MesoPlasma™ technology.
CVD’s customers include global leaders in aerospace, medical, petroleum, semiconductor, mems, and advance materials research. As a result of being focused on chemical vapor deposition processes, coating services, and selling our CVD research solutions worldwide, we have the unique and diversified capability to provide solutions to many of the industrial applications presented to us, thus fueling our growth into the future.
Latest Press Releases
CENTRAL ISLIP, N.Y., (Business Wire) – November 21, 2017 - CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems, today announced the supply of. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – November 2, 2017 - CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems and materials has, through its. Continue reading
CENTRAL ISLIP, N.Y., (Business Wire) – October 31, 2017 - CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition systems, announced today that it will. Continue reading