Nanomaterials and Semiconductors

Nanomaterials & Semiconductors

FirstNano® R&D systems for processing graphene, carbon nanotubes, semiconducting nanowires, 2D materials, and thin films for research laboratories. CVD process equipment is used in the fabrication of solar cells and TCO coatings as well as semiconductors and optoelectronics materials.


Common semiconducting materials include silicon, germanium, arsenic, antimony, etc. They can be formed in binary, ternary, and Quaternary compounds with metals such as aluminum, gallium, and indium. They are also generated in the form of oxides, nitrides, carbides, etc. Each semiconducting material or compound has specific properties that can be exploited to realize a particular device. Common semiconducting thin films include silicon carbide (SiC), gallium nitride (GaN), gallium arsenide (GaAs), etc. Complex structures such as multi-layer stacks, nanowires/nanorods, and quantum dots can be produced using CVD processes.

For more information on the Silicon Carbide Semiconductor market click the button below.

CVD Equipment Corporation has over 40 years of experience in designing and manufacturing turn-key CVD systems. Our products meet the stringent demands required in order to maintain controllable and repeatable deposition of high quality, high purity semiconducting crystal structures, and epitaxial layers. We have developed a modular platform that allows user to configure their equipment for their specific requirements. Our technology is tried and tested, with systems in operation worldwide.

UHVCVD

UHVCVD System Features & Benefits:

Manufacturing Enterprise System (MES) Compatible Integration

CVDWinPrC™ system control software for real-time process control, graphing, data logging, and process recipe editing

Robust, low-maintenance design

TMDC

MOCVD System Features & Benefits:

Horizontal or Vertical process chamber

Wafer size is configurable to meet the requirements of end-user

Resistance, IR, or RF heated depending on the temperature requirements

Temperature controlled showerhead

Wafer rotation

LPECVD System Features & Benefits:

Multi-zone rolling resistance furnace for temperatures up to 700°C

+/- 0.25°C temperature uniformity over the flat zone

Rapid controlled heat-up and cool-down of LPE boat

Automatic boat slider

LPE150

CVD processes are widely used in solar cell manufacturing, from the deposition of crystalline silicon in a c-Si solar cell, to the deposition of a range of different materials in thin film solar cells (TFSCs). Other examples of uses of CVD Equipment Corporation’s CVD processing equipment in the solar industry include deposition of amorphous silicon (a-Si), micro-crystalline silicon (μc-Si), silicon, silicon-germanium, etc. Also, our equipment is used for trichlorosilane (TCS) source quality control, antireflection (AR) coatings such as silicon nitride and high or low temperature silicon dioxide, transparent conductive oxides (SnO2, ZnO, etc.), sulfurization/selenization, rapid thermal annealing, doping (e.g. using phosphoryl chloride, POCl3) and other related dopant diffusion processes needed for next generation silicon and copper-indium-gallium-selenide (CIGS) solar cell modules.

Si wafer based Solar Cell

Diffusion

Oxidation

Si based Thin Film Solar Cell

a-Si and μc-Si Deposition

Chemical Compound based Thin Film Solar Cell

Selenization and Sulfurization

Multi-junction Photovoltaic Cell

Antireflection Coating

Antireflection Coating

TCO Coating

Silane and Chlorosilane Precursor Quality Control

CVDSiQC

SiQC System Features & Benefits:

Preprogrammed Recipes for Silicon Epitaxial Deposition

Processes up to two float zone wafers per run

High purity susceptor

Cantilevered automatic substrate loading/unloading system

Loadlock isolates the process tube from ambient atmosphere during loading and unloading

APCVD System Features & Benefits:

Deposit a layer of material onto wafers or other types of substrates

Grow epitaxial films of Si, compound semiconductors, SiO2, anti-reflection (AR) coatings, and transparent conductive oxide (TCO) coatings

Surface-finishing process for items such as tools and turbine blades to improve lifetime and performance

APCVD System

About Us

Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
enabling tomorrow’s technologies ™ ”