Crystalline compound semiconducting materials form the foundation of many devices that are widely used in everyday life, including complementary metal-oxide-semiconductor (CMOS) integrated circuits (ICs), optoelectronic and photonic devices, and micro-electro-mechanical systems (MEMS). Chemical vapor deposition (CVD) is the most widely adopted industrial technique for producing semiconducting thin films and complex layered micro- and nano-structures. The CVD process is versatile and can be tuned to produce homoepitaxial and heteroepitaxial monocrystalline materials as well as polycrystalline and amorphous materials. A high level of dopant control can be readily achieved for