About CVD deposition equipment for solar photovoltaics
CVD Equipment Corporation provides key process equipment used in the fabrication of solar cells. Our equipment is used for steps including diffusion, deposition of antireflective layers, oxidation, and silicon epitaxial deposition.
Additionally, we provide our application laboratory services, for research laboratories and companies, to support their efforts for improving solar cell functionality, properties, and efficiency. We supply CVD production equipment for use in large scale solar cell manufacturing, with a low cost-of-ownership (COO).
CVD processes are widely used in solar cell manufacturing, from the deposition of crystalline silicon in a c-Si solar cell, to the deposition of a range of different materials in thin film solar cells (TFSCs). Other examples of uses of CVD Equipment Corporation’s CVD processing equipment in the solar industry include deposition of amorphous silicon (a-Si), micro-crystalline silicon (μc-Si), silicon, silicon-germanium, etc. Also, our equipment is used for trichlorosilane (TCS) source quality control, antireflection (AR) coatings such as silicon nitride and high or low temperature silicon dioxide, transparent conductive oxides (SnO2, ZnO, etc.), sulfurization/selenization, rapid thermal annealing, doping (e.g. using phosphoryl chloride, POCl3) and other related dopant diffusion processes needed for next generation silicon and copper-indium-gallium-selenide (CIGS) solar cell modules.
- Si wafer based Solar Cell
- Si based Thin Film Solar Cell
- a-Si and μc-Si Deposition
- Chemical Compound based Thin Film Solar Cell
- opens in a new windowSelenization and Sulfurization
- Multi-junction Photovoltaic Cell
- Antireflection Coating
- opens in a new windowTCO Coating
- opens in a new windowSilane and Chlorosilane Precursor Quality Control