What can CVD do for the semiconductor industry?
Crystalline compound semiconducting materials form the foundation of many devices that are widely used in everyday life, including complementary metal-oxide-semiconductor (CMOS) integrated circuits (ICs), optoelectronic and photonic devices, and micro-electro-mechanical systems (MEMS). Chemical vapor deposition (CVD) is the most widely adopted industrial technique for producing semiconducting thin films and complex layered micro- and nano-structures. The CVD process is versatile and can be tuned to produce homoepitaxial and heteroepitaxial monocrystalline materials as well as polycrystalline and amorphous materials. A high level of dopant control can be readily achieved for fine tuning of the electronic properties.
Common semiconducting materials include silicon, germanium, arsenic, antimony, etc. They can be formed in binary, ternary, and Quaternary compounds with metals such as aluminum, gallium, and indium. They are also generated in the form of oxides, nitrides, carbides, etc. Each semiconducting material or compound has specific properties that can be exploited to realize a particular device. Common semiconducting thin films include silicon carbide (SiC), gallium nitride (GaN), gallium arsenide (GaAs) etc. Complex structures such as multi-layer stacks, nanowires/nanorods and quantum dots can be produced using CVD processes.
CVD Equipment Corporation has over 40 years’ experience in designing and manufacturing turn-key CVD systems. Our products meet the stringent demands required in order to maintain controllable and repeatable deposition of high quality, high purity semiconducting crystal structures and epitaxial layers. We have developed a modular platform that allows the user to configure their equipment for their specific requirements. Our technology is tried and tested, with systems in operation worldwide.
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