Cluster Tools

Cluster Tool Technology

Cluster-Tool-Injectors
Cluster-Tool-Robotic-Arm
Cluster-Tool-Wafer-Feed

The cluster tool system allows for automatic transfer of a substrate between process chambers to deposit different layers using different processes. The system can also be used for parallel processing of multiple substrates to increase throughput and productivity. Typical configuration includes a load lock chamber for loading substrates, a transfer chamber, and several process chambers which can perform one or more processes. The substrates are transferred between chambers under a vacuum using a robotic arm to prevent exposure to air which prevents oxidation and contamination.

CVD Equipment Corporation engineers and manufactures cluster tools to meet your process and throughput requirements. All chambers are integrated into a central control and safety system. Recipes are programmed and system control is automated through our proprietary real-time instrument control, data logging, and process editing software suite, CVDWinPRC™.

System Features & Options

  • CVDWinPrC™ based process control software for real time process control, data logging and display, recipe generation and editing
  • Load lock chamber
  • Transfer chamber with a robotic arm to prevent exposure to air to avoid oxidation and contamination
  • Process chambers which can perform one or more processes
  • Vacuum system
  • LPCVD
  • APCVD
  • MOCVD
  • PECVD
  • RTP
  • Etching
  • Thermal Evaporation
  • Sputtering
  • E-Beam Evaporation
  • UHVCVD

The images shown are examples of many CVD systems we design and manufacture in-house for innovators working on next generation process and material development. We have customers worldwide at universities, governmental labs, start-ups, and fortune 500 companies.