Category Archive for : ‘Press Releases’

RONKONKOMA, N.Y., Jan. 10 /PRNewswire-FirstCall/ — FirstNano®, a division of CVD Equipment Corporation (Nasdaq: CVV), announced today the shipment of an ET3000-BN Chemical Vapor Deposition System to the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL). The ET3000-BN system was configured specifically for Boron Nitride Nanotubes (BNNT’s) and is, to the best of our knowledge, the first commercial system offered for this type of material growth.

CFN is one of five nanoscale science research centers established by the US DOE Office of Basic Energy Science

RONKONKOMA, N.Y., Dec. 12 /PRNewswire-FirstCall/ — CVD Equipment Corporation (Nasdaq:CVV) announced today that it has signed a contract to purchase a 13,300 square foot facility in Ronkonkoma, NY for expansion of it’s FirstNano® Laboratory in Q1, 2008. The larger facility will enable FirstNano®, a division of CVD Equipment Corporation, to work with multiple startup and established companies in the Nano, Solar, Energy and Semiconductor fields for commercialization of their Intellectual Property (IP).

Mr. Rosenbaum, President of CVD, said, “The relocation of our FirstNano® Laboratory into larger quarters

RONKONKOMA, N.Y., Oct. 22 /PRNewswire-FirstCall/ — CVD Equipment Corporation (Nasdaq: CVV), a designer and manufacturer of standard and custom state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials and coatings for research and industrial applications, announced today that it has appointed Dr. Karlheinz Strobl as Vice President of Business Development. Strobl’s responsibilities in this newly-created position will include new product, process and market development and identifying and optimizing the strategic opportunities between CVD and the emerging nano, solar and clean energy markets, as

RONKONKOMA, N.Y., Aug. 2 /PRNewswire-FirstCall/ — FirstNano®, a division of CVD Equipment Corporation (Amex:CVV) has announced today the shipment of our first EasyTube® 6000 Chemical Vapor Deposition system. The multi-tube EasyTube® 6000 horizontal system is specifically designed for the Research, University and Laboratory market and is capable of processing up to 100 – 6″ diameter or smaller wafers. The system is available with processes for research applications in the Semiconductor, MEM, Nanotechnology, and Solar Cell markets.

The EasyTube® 6000 is another addition to our line of EasyTube®