Growth-Etch Metal–Organic Chemical Vapor Deposition Approach of WS2 Atomic Layers

Assael Cohen, Avinash Patsha, Pranab K. Mohapatra, Miri Kazes, Kamalakannan Ranganathan, Lothar Houben, Dan Oron, and Ariel Ismach

Metal–organic chemical vapor deposition (MOCVD) is one of the main methodologies used for thin-film fabrication in the semiconductor industry today and is considered one of the most promising routes to achieve large-scale and high-quality 2D transition metal dichalcogenides (TMDCs).

https://pubs.acs.org/doi/10.1021/acsnano.0c05394