First Nano Ships Boron Nitride Nano Tube System to Center for Functional Nanomaterials @ Brookhaven National Laboratory
RONKONKOMA, N.Y., Jan. 10 /PRNewswire-FirstCall/ -- FirstNano®, a division of CVD Equipment Corporation (Nasdaq: CVV), announced today the shipment of an ET3000-BN Chemical Vapor Deposition System to the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL). The ET3000-BN system was configured specifically for Boron Nitride Nanotubes (BNNT's) and is, to the best of our knowledge, the first commercial system offered for this type of material growth.
CFN is one of five nanoscale science research centers established by the US DOE Office of Basic Energy Science to provide state-of-the-art capabilities for the fabrication and study of nano-scale materials. The CFN features strong in-house scientific programs while offering broad access to its capabilities and collaboration through an active user program. This increases the exposure of First Nano deposition equipment to a broad range of users from University, Government and Industrial Research Laboratories, here in the US, and abroad.
BNNT's have attracted more attention from researchers in recent years because of their unique electronic properties, high thermal conductivity, chemical resistance and high strength to weight mechanical properties. It has been proposed that BNNT will have wide applications in nano-electronic devices, thermal transfer and high strength composite materials.
To date, BNNT's have been made in only a few research laboratories by plasma-arc, laser ablation or chemical vapor deposition. It remains a challenge to control the diameter, length, uniformity and purity of the synthesized BNNT's because of their critical growth conditions. the FirstNano® EasyTube® ET3000-BN system provides this precise control of pressure, chemical delivery and temperature in excess of 1500 Celsius for BNNT's synthesis using a liquid Boron source, Diborane and Ammonia. This system further expands our FirstNano® equipment product line designed for "enabling tomorrow's technology™," today.
About First Nano and CVD Equipment Corporation
FirstNano® is a division of CVD Equipment Corporation (Nasdaq: CVV) is a designer and manufacturer of standard and custom state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials, and coatings for research and industrial applications. We offer a broad range of chemical vapor deposition, gas control, and other equipment that is used by our customers to research, design, and manufacture semiconductors, solar cells, carbon nanotubes, nanowires, LEDs, MEMS, industrial coatings, and equipment for surface mounting of components onto printed circuit boards.
The Private Securities Litigation Reform Act of 1995 provides a "safe harbor" for forward-looking statements. Certain information included in this press release by CVD Equipment Corporation (CVD), as well as information included in oral or other written statements made or to be made by CVD, contains statements that are forward-looking. All statements other than statements of historical fact are hereby identified as "forward-looking statements," as that term is defined in the Private Securities Litigation Reform Act of 1995. Such forward looking information involves a number of known and unknown risks and uncertainties that could cause actual results to differ materially from those discussed or anticipated by management. Potential risks and uncertainties include, among other factors, industry specific and general business conditions, competitive market conditions, success of CVD's growth and sales strategies, possible customer changes in delivery schedules, cancellation of orders, delays in product shipments, delays in obtaining parts from suppliers, failure to satisfy customer acceptance requirements and other risk factors described in CVD's SEC filings. All forward-looking statements are based on management's estimates, projections and assumptions as of the date hereof and CVD assumes no obligation to update this press release.
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