For twenty years, CVD Equipment Corporation has been providing custom research and production Chemical Vapor Deposition systems to many of the large semiconductor manufacturers and research laboratories. We can fabricate from your drawings or use our in-house engineering to bring your ideas to fruition. Our innovative solutions to your needs comes from years of experience, while our extensive Computer Aided Design (CAD) systems library helps minimize basic design engineering by drawing on concepts previously used. Our CAD systems allow you to visualize your system prior to fabrication.

Our expertise in controlling gas flow, pressure or vacuum levels and temperature can help solve your problems. System designs allow for process heating via resistance, induction or infra-red and operational pressures from Ultra High Vacuum to 50 Atmospheres. In addition, we have our own quartzware fabrication facility to quickly manufacture process chambers, gas injectors, wafer boats and other work fixtures.

For process control, our standard Microprocessor Control System is extremely versatile and provides for real-time control in either an automatic or manual control mode. The Pentium based microprocessor control system generates the rampable, programmable temperature, pressure and gas flow profiles. It also sequences valves, movements, vacuum pumps and continuously monitors and displays on a real-time basis all temperatures, pressures, gas flows, valve status, safeties, etc. The system data logs process parameters and allows for hard copy printout or exporting of data to a spreadsheet. Our "User Friendly" software allows recipes to be written and executed with simple commands for even the most intricate layers.

EasyTube™ 3000 - SiQC

EasyTube™ 3000 - SiQC Horizontal, Silicon Epitaxial Chemical Vapor Deposition System is designed to grow ultra high purity (intrinsic) monocrystalline silicon layers on a monocrystalline silicon substrate for qualifying TCS and other Chlorosilanes for Polysilicon manufacturing facilities. The system is capable of meeting the exact criteria needed to produce quality Silicon Epitaxial layers to evaluate your feedstock.

EasyTube™ 3000 - SiQC provides optimum control over processing up to (2) two 13mm round wafers per run at temperatures 1200 degrees Celsius using RF Induction Heating. A water-cooled, high purity quartz process tube is provided to minimize tube deposits and keep the quartz tube cool even during the long deposition runs. Minimum tube deposits allow more runs to be done between tube cleanings, reduces the influence of previous run deposits on subsequent runs and prevents the leaching out of impurities from within the quartz tube (i.e. Boron) when it gets hot.

The EasyTube™ 3000 - SiQC Chlorosilane Liquid Source Vapor Delivery System uses a stainless steel bubbler with automatic liquid source fill and purge valves. It is interfaced with the customer provided Chlorosilane delivery line to provide continuous sample collection fromtheChlorosilane production line.

EasyTube™ 3000 - SiQC is easy to use with our PC controlled
recipe driven software thatalso automatically acquires and logs data for verifiable repeatability.

EasyTube™ 3000 - SiQC is designed to meet today’s stringent safety standards. The comprehensive hardware and software interlocks monitor all critical equipment and process conditions.

The system is Semi-S2/S8 and CE compliant.

To read more about the EasyTube™ 3000 - SiQC system click here